• Horizontal Batch Diffusion Furnace for Phosphorus/Boron Doping/Diffusion (POCL3, BBr3, etc.)

• Horizontal Batch PECVD Furnace for SixNy Antireflective coating and passivation

• Automatic/Manual Source Gas Cabinets (GC) for High Purity Gases (SiH4, NH3, O2, etc.)

• Automatic/Manual Valve Manifold Boxes (VMB) for independent Gas/Liquid Delivery Lines to multiple furnaces and/or other equipment

• Automatic Temperature Controller for furnace bubbler containers (POCL3/BBr3, etc.)

• Bulk Liquid Media Delivery for automatic furnace bubbler containers refill

• Horizontal Batch Diffusion Furnace for Wet/Dry Oxides (passivation, emitters masking and other on demand production cycle steps)

Options:

Wafer Handling Automation (Wafer Transfer System, Boat Elevator, Stocker, etc.)