Sputtering System

  • 10-10 Torr Ultimate vacuum

  • Substrate heating up to 1000˚C

  • HV and UHV available

  • Custom Design available

  • Fully Safety Interlocked

  • Single, multi-layer or co-deposition

  • Full automatic control system with touch screen display

  • Real time record system data (pressure, substrate temperature, deposition rate)

  • Real time process control to provide precise film quality and film reliability

  • Multiple levels of access with password protection

  • Choice of Turbo/Cryo/Diffusion Pump available

  • Extra spare port for OES, RGA or extra process monitoring

  • Substrate Size: up to 12”

  • Thickness uniformity: <±3%


  • Load-Lock and auto wafer load unload

  • RF or DC bias

  • Thickness Monitor

  • Substrate RF Plasma Cleaning

  • Ion-source

  • Residual Gas Analyzer

  • Connect with Glove box


  • Semiconductors

  • Nanotechnology

  • TCO (ITO, ZnO, AZO, GZO, IZO, IGZO etc)

  • Oxide, Nitride and Metal materials research

  • Solar-cell

  • Optical

Tel: +84-24-6683-1909

Email: contacts@amst.com.vn