Sputtering System
10-10 Torr Ultimate vacuum
Substrate heating up to 1000˚C
HV and UHV available
Custom Design available
Fully Safety Interlocked
Single, multi-layer or co-deposition
Full automatic control system with touch screen display
Real time record system data (pressure, substrate temperature, deposition rate)
Real time process control to provide precise film quality and film reliability
Multiple levels of access with password protection
Choice of Turbo/Cryo/Diffusion Pump available
Extra spare port for OES, RGA or extra process monitoring
Substrate Size: up to 12”
Thickness uniformity: <±3%
Options
Load-Lock and auto wafer load unload
RF or DC bias
Thickness Monitor
Substrate RF Plasma Cleaning
Ion-source
Residual Gas Analyzer
Connect with Glove box
Applications
Semiconductors
Nanotechnology
TCO (ITO, ZnO, AZO, GZO, IZO, IGZO etc)
Oxide, Nitride and Metal materials research
Solar-cell
Optical
Tel: +84-24-6683-1909
Email: contacts@amst.com.vn